Rapid Thermal Annealing (RTA) System
The RTA system is used for annealing the semiconductor wafers after deposition of materials (i.e. Post Deposition Annealing (PDA)) and also after deposition of metals (i.e. Post Metallization Annealing (PMA)). Rapid Thermal Annealing (RTA) is a subset of Rapid Thermal Processing (RTP) used in semiconductor manufacturing to heat single wafers to high temperatures often exceeding 1200°C within seconds.
Manufacturer:
Fourvac Technology Pvt. Ltd.
Model:
NA
Applications
- Post Deposition Annealing (PDA)
- Post Metallization Annealing (PMA)
- Semiconductor wafer processing
- Rapid thermal processing
Internal (KBCNMU): ₹
300
External Academic: ₹
500
Industry: ₹
1000
GST
18% extra
Contact Information
Prof. Jaydeep Vinayak Sali
Instrument Incharge
📧
jvsali@nmu.ac.in
📞
8421806270